Room-Temperature Preperation of InGaAsN Quantum Dot Lasers Grown by MOCVD

نویسندگان

  • Q. Gao
  • M. Buda
  • H. H. Tan
  • C. Jagadish
چکیده

An InGaAsN single-layer quantum dot ~QD! laser structure was grown on GaAs substrates by metalorganic chemical vapor deposition ~MOCVD!. The ridge-waveguide edge emitting laser diodes ~LD! were fabricated and characterized. We demonstrate room-temperature operation of InGaAsN QD lasers with an emission wavelength of 1078 nm. Electroluminescence spectra as a function of injection current showed that InGaAsN QD LDs lased from an excited QD state at room temperature. The evidence for QD-related absorption was obtained from the comparison of photocurrent spectra between a reference InGaAs QW and the InGaAsN QD structures. © 2004 The Electrochemical Society. @DOI: 10.1149/1.1848293# All rights reserved.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Long wavelength MOCVD grown InGaAsN-GaAsN quantum well lasers emitting at 1.378-1.41 /spl mu/m - Electronics Letters

Low threshold InGaAsN QW lasers with lasing wavelength at 1.378 and 1.41 mm were demonstrated by metal organic chemical vapour deposition (MOCVD). The threshold current densities are 563 and 1930 A=cm for the 1.378 and 1.41 mm emitting lasers, respectively. The significant improvement of device performance is believed due to utilisation of high temperature annealing and introduction of GaAsN ba...

متن کامل

Characteristics of InGaAsN/GaAsN quantum well lasers emitting in the 1.4-mm regime

To improve the performance of metalorganic chemical vapor deposition (MOCVD)-grown long wavelength InGaAsN quantum well (QW) diode lasers emitting beyond 1.3 mm, a detailed examination of the growth parameters was performed, including DMHy/V ratio, QW growth temperature, choice of barrier material and thermal annealing temperature. This study reveals that a growth temperature in the 530–540 1C ...

متن کامل

High-Performance 1200-nm InGaAs and 1300-nm InGaAsN Quantum-Well Lasers by Metalorganic Chemical Vapor Deposition

In this paper, we present the characteristics of high-performance strain-compensated MOCVD-grown 1200-nm InGaAs and 1300-nm InGaAsN quantum-well (QW) lasers using AsH3 and U-Dimethylhydrazine as the group V precursors. The design of the InGaAsN QW active region utilizes an In-content of approximately 40%, which requires only approximately 0.5% N-content to realize emission wavelengths up to 131...

متن کامل

Physics and characteristics of high performance 1200 nm InGaAs and 1300–1400 nm InGaAsN quantum well lasers obtained by metal–organic chemical vapour deposition

Here we present the physics and device characteristics of high performance strain-compensated MOCVD-grown 1200 nm InGaAs and 1300–1400 nm InGaAsN quantum well (QW) lasers. Utilizing the GaAsP barriers surrounding the highly strained InGaAsN QW active regions, high performance QW lasers have been realized from 1170 nm up to 1400 nm wavelength regions. The design of the InGaAsN QW active region u...

متن کامل

Electrically pumped continuous-wave 1.3 µm InAs/GaAs quantum dot lasers monolithically grown on on-axis Si (001) substrates.

We report on the first electrically pumped continuous-wave (cw) InAs/GaAs quantum dot (QD) lasers monolithically grown on on-axis Si (001) substrates without any intermediate buffer layers. A 400 nm antiphase boundary (APB) free epitaxial GaAs film with a small root-mean-square (RMS) surface roughness of 0.86 nm was first deposited on a 300 mm standard industry-compatible on-axis Si (001) subst...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2004